Labtron Vacuum Spin Coater coats substrates using rotational speeds from 100 to 10,000 rpm and accommodates wafers up to 4 inches in diameter. The vacuum chuck secures substrates during rotation, while programmable five-step control manages speed, acceleration, and duration. Its brushless DC motor supports low-noise operation. Manufactured for wafer and thin-film coating in research laboratories and industrial settings, this vacuum coating machine supports substrate preparation.